
Intelligent Variable-Frequency Control
Through a PLC + HMI system, multiple process curves can be preset to enable real-time control of rotational speed (5–120 rpm) and mixing time. The system is adaptable to dry, wet, vacuum, and high-temperature processes, increasing single-batch processing capacity by 30%–50%.
Lithium Iron Phosphate (LFP) Cathode Materials
Vacuum mixing technology enables uniform nano-scale coating of conductive additives (such as carbon nanotubes), effectively enhancing battery energy density.
Graphite Anode Granulation
With customized shear blade designs, natural graphite is processed into near-spherical granules (D50 = 18–22 μm), improving first-cycle efficiency by 5%.
CMP Slurries
Nano-abrasive dispersion is completed under inert gas protection, achieving a particle agglomeration rate of less than 0.3%, meeting polishing requirements for process nodes below 14 nm.
Sputtering Target Raw Materials
The vacuum mixing system ensures metal powder oxygen content below 50 ppm, significantly improving the uniformity of sputtered thin films.
The enclosed mixing process reduces dust emissions by 90%. When combined with an exhaust gas recovery system, it fully complies with stringent EHS (Environment, Health, and Safety) standards.
With outstanding performance and cross-industry adaptability, the Sentec Intensive Mixer is redefining mixing process standards and has become a key enabling piece of equipment driving the advancement of Industry 4.0.